The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Jan. 17, 2002
Applicants:
Gérard Passemard, Lumbin, FR;
Emmanuel Sicurani, Meylan, FR;
Charles Lecornec, Grenoble, FR;
Inventors:
Assignees:
STMicroelectronics SA, Montrouge, FR;
Commissariat a l'Energie Atomique, Paris Cedex, FR;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
The process includes depositing a filling material in trenches formed in at least one layer of dielectric so as to fill open pores in the dielectric. The filling material is intended to prevent the subsequent diffusion of the interconnect metal and/or of a metal of a diffusion barrier, and may be non-porous. The filling material preferably has a low dielectric constant.