The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Sep. 12, 2003
Seung-man Yang, Daejeon, KR;
Ki-ra Yi, Gyeonggi-do, KR;
Yong- Hak Park, Busan, KR;
Sarah Kim, Daejeon, KR;
Seung-Man Yang, Daejeon, KR;
Ki-Ra Yi, Gyeonggi-do, KR;
Yong- Hak Park, Busan, KR;
Sarah Kim, Daejeon, KR;
Abstract
A method of preparing patterned colloidal crystals includes filling a monomer solution in the interstices between particles of planar colloidal crystals for photopolymerization inside them, and performing a selective photopolymerization process between the colloidal crystals using a mask. In one exemplary method, a first monomer solution for photopolymerization is filled inside planar colloidal crystals. A first selective photopolymerization process is performed inside the colloidal crystals using a mask. A second monomer solution for photopolymerization is filled into the firstly patterned colloidal crystals. At least one additional photopolymerization process is performed inside the firstly patterned colloidal crystals using an additional mask. Through this method, colloidal crystalline regions oriented in the same direction with different refractive indexes can be controlled in a level of μm. Further, repeated patterns can be inexpensively and easily prepared.