The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
Feb. 24, 2003
Applicants:
Thaddeus Schroeder, Rochester Hills, MI (US);
Shih-chia Chang, Bloomfield Hills, MI (US);
Lorenzo Guadalupe Rodriguez, El Paso, TX (US);
Inventors:
Thaddeus Schroeder, Rochester Hills, MI (US);
Shih-Chia Chang, Bloomfield Hills, MI (US);
Lorenzo Guadalupe Rodriguez, El Paso, TX (US);
Assignee:
Delphi Technologies, Inc., Troy, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/06 (2006.01); H01F 41/14 (2006.01); C25D 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for forming magnetic targets for position and speed sensors, and magnetic targets formed according to the process. The targets are formed on a conductor-clad substrate by first applying a layer of photoresist material and then patterning and etching the photoresist to form trenches defining the shape and dimensions of the targets. Magnetic material is formed in the trenches and magnetized to form the targets.