The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Aug. 07, 2003
Hironori Sahara, Kawasaki, JP;
Morio Shimizu, Chofu, JP;
Hironori Sahara, Kawasaki, JP;
Morio Shimizu, Chofu, JP;
National Aerospace Laboratory of Japan, Tokyo, JP;
Abstract
This electromagnetic wave concentrator having high rigidity and flexibility is suitable for communications and is produced by molding using stress relaxation in thin-film material. An ultra-lightweight electromagnetic wave concentrator is obtained by increasing the rigidity by forming a thin-film curved body of an electromagnetic wave reflective surface having a paraboloid shape. Reinforcing grooves in the reflective surface increase rigidity. To form the reflective surface shape and the reinforcing grooves, pressure is applied to the thin-film material with a molding die, or the thin-film material is attached to the molding die by pressure while heating the thin-film material with a heating device, such as a thermostatic chamber.