The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Sep. 04, 2002
Osamu Tokuhiro, Gamou-Gun Shiga, JP;
Hiroyuki Ueda, Yasu-Gun Shiga, JP;
Masahiko Machida, Tokyo, JP;
Osamu Tokuhiro, Gamou-Gun Shiga, JP;
Hiroyuki Ueda, Yasu-Gun Shiga, JP;
Masahiko Machida, Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of manufacturing a liquid crystal panel comprises the steps of forming a gate insulating film, a channel layer and an etching stopper layer on a transparent substrate bearing a gate electrode, exposing the substrate to light from its back surface side by using the gate electrode as a light shielding mask by photolithography, developing the resist, etching the etching stopper layer, forming a source/drain layer, and etching the source/drain layer and a remaining part of the etching stopper by chemical gas phase etching.