The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Apr. 16, 2004
Applicants:
Geun-young Yeom, Seoul, KR;
Do-haing Lee, Kyeonggi-do, KR;
Byoung Jac Park, Chungcheongnam-do, KR;
Inventors:
Assignee:
Sungkyunkwan University, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a neutral beam source used for etching a semiconductor device. The neutral beam source includes a plasma chamber having quartz provided at an outer wall thereof with an RF coil, a grid assembly, a reflective member, and an electromagnet arranged around the plasma chamber while surrounding the plasma chamber. Plasma density becomes high due to the magnetic field applied to the plasma chamber so that an amount of ion flux is increased.