The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2006

Filed:

Oct. 11, 2002
Applicants:

Byong K. Cho, Rochester Hills, MI (US);

SE H. OH, Troy, MI (US);

Steven J. Schmieg, Troy, MI (US);

Inventors:

Byong K. Cho, Rochester Hills, MI (US);

Se H. Oh, Troy, MI (US);

Steven J. Schmieg, Troy, MI (US);

Assignee:

General Motors Corporation, Detroit, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C01B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma reactor for automotive exhaust gas applications which efficiently promotes diffusion, mass transfer and chemical reaction processes of atoms, ions and radicals, in that the ground (outer) electrode has an axially discrete pattern which provides alternating regions of active and passive electric field along the axial direction of the plasma reactor. As the exhaust gas passes axially along the plasma reactor, each active region produces plasma atoms, ions and radicals, which then have time to react with the NOover the course of the adjacent passive region. In this manner, successive active regions produce copious atoms, radicals and ions, and the adjacent passive regions provide time for these radicals and ions to react with the NOand hydrocarbons before the next active region is encountered by the moving stream of exhaust gas, thereby enhancing the performance of the plasma reactor.


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