The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Nov. 26, 2002
Yukihiro Katai, Kanagawa, JP;
Tadahiro Tsujimoto, Kanagawa, JP;
Toshikazu Nakamura, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In the transparent film of optical application or the support for photographic material produced by a solution film forming method, the polymer resin film on which any coating unevenness does not occur even when a functional layer is coated on the film surface and the manufacturing method for the film are proposed. To be concrete, a polymer resin film produced by the solution film forming method characterized by that the pitch a [cm] of the periodic thickness unevenness of web longitudinal direction and a thickness unevenness factor d [%] satisfy formula (1) described below.−0.910.6+1.01  (1) The manufacturing method using said formula is also proposed.