The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Dec. 04, 2003
Yasuo Murakami, Ushiku, JP;
Hiroshi Murakami, Kyoto, JP;
Yasuo Murakami, Ushiku, JP;
Hiroshi Murakami, Kyoto, JP;
Nissin Electrci Co., LTD, Kyoto, JP;
Abstract
A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc discharge during deposition of the film onto the deposition target object. For example, the vacuum arc vapor deposition apparatus includes a shield member moved to and away from a position between a vapor source and a holder for supporting the deposition target object, a drive device for locating the shield plate selectively in a shield position between the vapor source and the holder, and a retracted position shifted from the shield position, a detector (e.g., current detector) detecting turn-on/off of the vacuum arc discharge, and a control portion controlling the drive device to locate the shield plate in the shield position when the detector detects turn-off of the vacuum arc discharge, and to locate the shield plate in the retracted position when a time required for stabilizing the vacuum arc discharge elapses after the detector detected turn-on of the vacuum arc discharge.