The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Feb. 03, 2004
Hiroshi Aoto, Kanagawa, JP;
Kenichi Takeda, Kanagawa, JP;
Tetsuro Fukui, Kanagawa, JP;
Toshihiro Ifuku, Kanagawa, JP;
Hiroshi Aoto, Kanagawa, JP;
Kenichi Takeda, Kanagawa, JP;
Tetsuro Fukui, Kanagawa, JP;
Toshihiro Ifuku, Kanagawa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2:=()×()  (1)where, Cis a count number of a peak of a (00l') face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cbecomes maximum); Cis a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cbecomes maximum); Wis a half-value width of a peak of the (00l′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wis a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.