The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Feb. 25, 2003
Yasuyuki Ogiwara, Tokyo, JP;
Yasuyuki Ogiwara, Tokyo, JP;
Ichikawa Co., LTD, Tokyo, JP;
Abstract
The object of the present invention is to provide an open-ended base fabric for a papermaking press felt wherein the shape of seam loops are retained to facilitate the mounting operation of the press felt. The object is achieved by an open-ended base fabric for papermaking press felt, comprising a continuous MD thread in the MD direction disposed in each layer constituting both surfaces of the base fabric and CD threads in the CD direction interwoven with the MD thread to connect each layer, the continuous MD thread forming a loop portion for inserting a seam thread at both ends of the base fabric, wherein said base fabric is provided with a control thread along each end edge of the CD thread arrangement, said control thread being interwoven in a different weave pattern from that of the CD thread in the base fabric, and said control thread urges a MD thread near both ends not to deviate in the outward direction and/or the CD direction so that the shape of said loop portion for inserting a seam thread is retained.