The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Mar. 04, 2004
Ming LI, Chelmsford, MA (US);
Ming Li, Chelmsford, MA (US);
Matsushita Electric Industrial, Co. Ltd., Osaka, JP;
Abstract
A method for manufacturing a microstructure, which includes at least one feature having a dimension less than 200 nm, on a work piece. Pulses of UV laser light having a duration of less than about 1 ps and a peak wavelength of less than about 380 nm are generated. These pulses of UV laser light are focused to a substantially diffraction limited beam spot within a target area of the work piece. The fluence of this substantially diffraction limited beam spot in the target area of the work piece is controlled such that the diameter of the section of the target area machined by one of the pulses of UV laser light is less than 200 nm.