The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Mar. 13, 2003
Seung Sang Hwang, Seoul, KR;
Soon Man Hong, Seoul, KR;
Eung Chan Lee, Incheon, KR;
Seung Pyo Hong, Seoul, KR;
Seung Sang Hwang, Seoul, KR;
Soon Man Hong, Seoul, KR;
Eung Chan Lee, Incheon, KR;
Seung Pyo Hong, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
Highly regular and well-defined structured polyorganosilsesquioxane polymer with superior heat resistance, combustion resistance and flexibility, wherein same or different kinds of substituents are bonded alternately, and the preparation method thereof. The polyorganosilsesquioxane prepared according to the present invention has a small molecular weight distribution and a high molecular weight, and is soluble in organic solvents because a three-dimensional network structure is not formed during the preparative condensation polymerization. Polyalkylaromaticsilsesquioxane obtained from the preparing method of the present invention is a useful heat-resistant material. It can be used as a heat-resistant coating agent, a protective coating agent of optical fiber, a coating material for resistor, heat-resistant paint, an adhesive and a releasing agent for precise molding. Also, it can be used for the semiconductor protective layer, interlayer dielectrics for semiconductor integration (e.g. LSI), new heat-resistant photoresist, and functional photonics materials.