The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Sep. 23, 2002
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Chung, Kyoungki-Do, KR;
Ki Soo Shin, Kyoungki-do, KR;
Kee Joon OH, Kyoungki-do, KR;
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Chung, Kyoungki-Do, KR;
Ki Soo Shin, Kyoungki-do, KR;
Kee Joon Oh, Kyoungki-do, KR;
Hynix Semiconductor Inc., Kyoungki-Do, KR;
Abstract
Cleaning solutions for removing photoresist resins remaining on the underlying layer patterns formed by photolithography process using the photoresist patterns as etching mask. The cleaning solution for removing photoresist comprises HO as solvent, amine compounds, hydrazine hydrate, transition metal-removing material and alkali metal-removing material. Photoresist coated on the top portion of underlying layers can be rapidly and effectively removed by the disclosed cleaning solution. In addition, the cleaning solution is environment-friendly because HO is used as the solvent, and has little effect on metal layers when underlying layers are formed of metals.