The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2006
Filed:
Oct. 01, 2003
Applicants:
Gilles Amblard, San Jose, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Inventors:
Gilles Amblard, San Jose, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Khoi A. Phan, San Jose, CA (US);
Assignee:
Advanced Micro devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed are immersion lithography methods involving using a base developer as an immersion lithography fluid. Consequently, it is unnecessary to contact a developer with an irradiated resist after the immersion lithography fluid is removed.