The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jan. 30, 2002
Jingfei MA, Houston, TX (US);
Yuval Zur, Haifa, IL;
Jingfei Ma, Houston, TX (US);
Yuval Zur, Haifa, IL;
GE Medical Systems Global Technology Company, LLC, Waukesha, WI (US);
Abstract
Artifacts in MR images caused by signals emanating from outside the design spherical volume (DSV) of the system are suppressed using customized spatial saturation pulse sequences interleaved with imaging pulse sequences. The spatial saturation pulse sequences are each customized to a specific region and are stored in a library for selective use when needed to suppress artifact producing signals emanating from specific regions outside the DSV.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile