The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Sep. 24, 2002
Applicants:
Shih-jong J. Lee, Bellevue, WA (US);
Seho OH, Bellevue, WA (US);
Donglok Kim, Issaquah, WA (US);
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
Abstract
An accumulation method for fast pattern search can accurately locate regular shaped patterns of interest. The method can be used for invariant search to match patterns of interest in images where the searched pattern varies in size or orientation or aspect ratio, when pattern appearance is degraded, and even when the pattern is partially occluded, where the searched image is large, multidimensional, or very high resolution, or where the pattern size is large. The computation requirement is independent of the size of the pattern region.