The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Mar. 01, 2004
Nobuto Kawahara, Tokyo, JP;
Nobuto Kawahara, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus comprises an irradiation optical system for irradiating a pattern formed on an original plate with light emitted from a light source, a projection optical system for projecting a light image from the pattern onto a substrate, a drivable substrate stage for mounting the substrate, and a light absorber disposed on the substrate stage, wherein the light absorber is disposed on the substrate stage by a thermal insulating layer and/or a cooling unit. Thus, an exposure apparatus can be provided which performs exposure of a wafer without being influenced by adverse effects such as thermal deformation of units such as a wafer stage or the like due to exposure process other than exposure of the wafer, such as pre-exposure.