The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Mar. 14, 2001
Takashi Nishi, Tsukuba-shi, Ibaraki, 305-0032, JP;
Takashi Nishi, Tsukuba-shi, Ibaraki, 305-0032, JP;
Other;
Abstract
The present invention relates to an exposure controlling photomask used to form a three-dimensional face structure in a resist pattern and having a light interrupting film able to be continuously controlled in transmitted light amount from 100% to 0%, and a production method thereof. A light interrupting filmis deposited on a substrate, and a photosensitive materialis coated on this light interrupting film. Next, irradiation is performed by changing the irradiating amount of an electron beam every place of the photosensitive materialusing an electron beam exposure technique. Next, development is performed and the photosensitive material is formed in the three-dimensional face structure. Next, in an etching process, the three-dimensional face structure is transferred to the light interrupting filmby etching-back the photosensitive materialand the light interrupting filmas a foundation.