The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Jul. 24, 2001
Applicants:

Orang Dialameh, Santa Monica, CA (US);

Hartmut Neven, Santa Monica, CA (US);

Inventors:

Orang Dialameh, Santa Monica, CA (US);

Hartmut Neven, Santa Monica, CA (US);

Assignee:

Nevengineering, Inc., Santa Monica, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is directed to a method and related system for determining a feature location in multiple dimensions including depth. The method includes providing left and right camera images of the feature and locating the feature in the left camera image and in the right camera image using bunch graph matching. The feature location is determined in multiple dimensions including depth based on the feature locations in the left camera image and the right camera image.


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Dialameh, Orang. (2006). System and method for feature location and tracking in multiple dimensions including depth (U.S. Patent No. 7050624). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7050624

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