The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Oct. 01, 2003
Applicants:

Frank X. Chen, Plainsboro, NJ (US);

Yee-shing Wong, Florham Park, NJ (US);

Jeffrey M. Eckert, Hazlet, NJ (US);

Feng Liang, Monmouth Junction, NJ (US);

Nanfei Zou, Edison, NJ (US);

Agnes S. Kim-meade, Fanwood, NJ (US);

Marc Poirier, Edison, NJ (US);

Tiruvettipuram K. Thiruvengadam, Kendall Park, NJ (US);

George G. Wu, Basking Ridge, NJ (US);

Inventors:

Frank X. Chen, Plainsboro, NJ (US);

Yee-Shing Wong, Florham Park, NJ (US);

Jeffrey M. Eckert, Hazlet, NJ (US);

Feng Liang, Monmouth Junction, NJ (US);

Nanfei Zou, Edison, NJ (US);

Agnes S. Kim-Meade, Fanwood, NJ (US);

Marc Poirier, Edison, NJ (US);

Tiruvettipuram K. Thiruvengadam, Kendall Park, NJ (US);

George G. Wu, Basking Ridge, NJ (US);

Assignee:

Schering Corporation, Kenilworth, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07D 211/30 (2006.01); C07D 221/06 (2006.01); C07D 453/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An enantioselective process for preparing intermediates useful in the preparation of the chiral tricyclic compound of formula I is disclosed.


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