The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Aug. 15, 2002
Douglas G Evans, Downingtown, PA (US);
Jeffrey C Kelly, Wilmington, DE (US);
Todd M Dewitt, Pottstown, PA (US);
Douglas G Evans, Downingtown, PA (US);
Jeffrey C Kelly, Wilmington, DE (US);
Todd M DeWitt, Pottstown, PA (US);
Kensey Nash Corporation, Exton, PA (US);
Abstract
Devices and processes (e.g., improved Plasticized Melt Flow processes (PMF) or improved Phase Separation Polymer Concentration (PSPC), etc.) used to make resorbable and non-resorbable structures for treating and/or healing of tissue defects are disclosed. Among the advantages of using these improved processes are the preservation of molecular weight and the broadening of the processing conditions for temperature sensitive polymers and therapies This reduction in processing temperature, pressure and time can help to preserve the molecular weight and/or integrity of the final product or any additive incorporated therein. The present invention relates to an improved porous implant wherein the pores of the implant present a second modeling material on their surfaces. This second material provides a textured or roughened face to the internal surfaces of pores. Additionally, this second material can be incorporated in sufficient quantity to, among other things, create a microporous network connecting interior closed cell pores with the exterior of the device.