The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Nov. 13, 2003
Jeong-rok Kim, Gyungsangbuk-Do, KR;
Kyung-kyu Kang, Gyungsangnam-Do, KR;
Jae-deuk Shin, Busan, KR;
Jo-hann Jung, Gyungsangbuk-Do, KR;
Myung-woo Nam, Gyungsangbuk-Do, KR;
Jeong-Rok Kim, Gyungsangbuk-Do, KR;
Kyung-Kyu Kang, Gyungsangnam-Do, KR;
Jae-Deuk Shin, Busan, KR;
Jo-Hann Jung, Gyungsangbuk-Do, KR;
Myung-Woo Nam, Gyungsangbuk-Do, KR;
LG. Philips LCD Co., Ltd., Seoul, KR;
Abstract
A fabrication process for transistor array substrates of different sizes on a common substrate provides quality control, yield, and space efficiency advantages. In particular, a four-mask process, including a mask with diffraction slits, may be employed to fabricate transistors that share common channel characteristics for each of the transistor array substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile