The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Oct. 23, 2000
Applicants:

Kuniaki Satou, Ibaraki-ken, JP;

Takahiko Kutsuna, Ibaraki-ken, JP;

Toshizumi Yoshino, Ibaraki-ken, JP;

Takao Hirayama, Ibaraki-ken, JP;

Mikio Uzawa, Ibaraki-ken, JP;

Inventors:

Kuniaki Satou, Ibaraki-ken, JP;

Takahiko Kutsuna, Ibaraki-ken, JP;

Toshizumi Yoshino, Ibaraki-ken, JP;

Takao Hirayama, Ibaraki-ken, JP;

Mikio Uzawa, Ibaraki-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are a photosensitive resin composition comprising a photosensitive resin (A), a photopolymerization initiator (B), and a flame retardant (C), in which a content of halogen atoms or antimony atoms in the flame retardant is 5% or less by weight; a photosensitive element using this; a method of manufacturing a resist pattern; a resist pattern; and a resist pattern laminated substrate.


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