The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Oct. 01, 2001
Kenji Fukui, Tokyo, JP;
Hiroaki Kamiya, Aichi, JP;
Kenji Fukui, Tokyo, JP;
Hiroaki Kamiya, Aichi, JP;
Waterware Inc., Tokyo, JP;
Abstract
A free radical solution producing apparatus, which comprises: a feed port () in which water is drawn, a dechlorination processing section () which produces first water by decomposing chlorine compounds in said water, a magnetic processing section () which produces second water by carrying out a process that applies a magnetic field to said first water, a radiation processing section () which produces third water by carrying out a process that irradiates a radiation to said second water, an ion exchange section () which produces fourth water by carrying out a process that performs an ion exchange for said third water, an electric field applying section () which produces fifth water by carrying out a process that applies a strong electric field to said fourth water, and a fifth water intake (-) from which said fifth water is obtained, produces water which has the effects of sterilizing and disinfection, and strong cleansing power.