The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Dec. 11, 2002
Applicants:

Chi Hyuck Park, Kyoungki-do, KR;

Hyang Yul Kim, Kyoungki-do, KR;

Tae Kyu Park, Kyoungki-do, KR;

Inventors:

Chi Hyuck Park, Kyoungki-do, KR;

Hyang Yul Kim, Kyoungki-do, KR;

Tae Kyu Park, Kyoungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a rubbing machine with realigning functions for use in an LCD manufacturing process and also to a rubbing method which is conducted using the same. The rubbing machine is used to determine the direction of alignment by rubbing an alignment film coated on a substrate disposed on a stage. In this rubbing machine, an realigning section for realigning a rubbing cloth is disposed on the portion of a rubbing roll in such a manner that the realigning section be in contact with the rubbing cloth.


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