The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2006

Filed:

Apr. 04, 2002
Applicants:

Masaki Kataoka, Ebina, JP;

Michiaki Murata, Ebina, JP;

Kenji Yamazaki, Ebina, JP;

Yoshihisa Ueda, Ebina, JP;

Norikuni Funatsu, Ebina, JP;

Kumiko Tanaka, Ebina, JP;

Inventors:

Masaki Kataoka, Ebina, JP;

Michiaki Murata, Ebina, JP;

Kenji Yamazaki, Ebina, JP;

Yoshihisa Ueda, Ebina, JP;

Norikuni Funatsu, Ebina, JP;

Kumiko Tanaka, Ebina, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21D 53/76 (2006.01); B23P 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ink jet recording head and a process for producing the same, and an ink jet recording apparatus are provided that improve the printing performance and also improve the production efficiency. A conjugated bodyformed by conjugating silicon wafersandis cut, whereby nozzlesare opened, and cutting into head chip units is carried out. At this time, deep groovesare formed on the surface of the silicon waferby anisotropic etching, and they are penetrated by etching on the opposite side. Groovesare formed on the silicon waferby using the thus penetrated deep groovesas a mask.


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