The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Dec. 09, 2004
Keiko Sekine, Tokyo, JP;
Hiroshi Kishimoto, Tokyo, JP;
Masaki Katsumata, Tokyo, JP;
Yoichi Higuchi, Tokyo, JP;
Nobuhiko Ichikawa, Tokyo, JP;
Tadatsugu Onuma, Tokyo, JP;
Keiko Sekine, Tokyo, JP;
Hiroshi Kishimoto, Tokyo, JP;
Masaki Katsumata, Tokyo, JP;
Yoichi Higuchi, Tokyo, JP;
Nobuhiko Ichikawa, Tokyo, JP;
Tadatsugu Onuma, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The invention provides a hologram plate which is used with the double-focus replication process, and which is integrated with a spacer to impart marring resistance thereto, and is integrated with a light absorbing layer to allow zero-order light and first-order light to have substantially the same intensity. This hologram platecomprises an array of collective element holograms for diffracting parallel light incident thereon at a specific wavelength and a specific incident angle in such a way that the light is converged onto a specific focal length position. The hologram plateis a multilayer structure made up of a first transparent substrate, a hologram layer, an adhesive layerand a second transparent substrate. The second transparent substratedefines a surface in contact with a hologram photosensitive materialduring hologram replication.