The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
May. 02, 2005
Applicants:
Yukio Taniguchi, Yokohama, JP;
Hirotaka Yamaguchi, Yokohama, JP;
Susumu Tsujikawa, Yokohama, JP;
Inventors:
Assignee:
Advanced LCD Technologies Development Center Co., Ltd., Yokohama, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/32 (2006.01); G01R 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.