The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jan. 30, 2004
Takuya Mashimo, Kumagaya, JP;
Tohru Takahashi, Osato-gun, JP;
Hiroyuki Oda, Fukaya, JP;
Takeshi Nakayama, Fukaya, JP;
Takuya Mashimo, Kumagaya, JP;
Tohru Takahashi, Osato-gun, JP;
Hiroyuki Oda, Fukaya, JP;
Takeshi Nakayama, Fukaya, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A shadow mask has a main mask and an auxiliary mask overlapped on the main mask. Electron beam passage apertures formed in the main mask and the auxiliary mask are arranged at given pitches in the direction of a major axis. Each electron beam passage aperture of the auxiliary mask is a communicating hole, which is formed of a smaller hole in that surface of the auxiliary mask which is in contact with the main mask and a larger hole opening in the opposite surface of the auxiliary mask. The smaller and larger holes of each electron beam passage aperture of the auxiliary mask have their respective central axes extending coaxially with each other and substantially at right angles to the surface of the auxiliary mask in the direction of the major axis.