The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2006

Filed:

Jan. 05, 2005
Applicants:

Toshihiro Kogami, Kyoto, JP;

Katsuhiro Ootani, Nara, JP;

Katsuya Arai, Kyoto, JP;

Inventors:

Toshihiro Kogami, Kyoto, JP;

Katsuhiro Ootani, Nara, JP;

Katsuya Arai, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrostatic discharge protected transistor of the present invention includes transistors in an active region composed of a p-type semiconductor substrate and surrounded by element isolation regions. On the active region composed of the p-type semiconductor substrate, an on-source silicide film and an on-drain silicide film are provided. The on-drain silicide film is not provided in a portion located on a boundary of each transistor and divided to correspond to the respective transistors. As a result, regions between respective pairs of the transistors have high resistances, and it is, therefore, possible to prevent a current from flowing between the different transistors and prevent local current concentration. It is thereby possible to allow the electrostatic discharge protected transistor to make most use of an electrostatic destruction protection capability per unit area without increasing an area of the transistor.


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