The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2006

Filed:

Feb. 19, 2004
Applicants:

Masashi Onishi, Kanagawa, JP;

Masaaki Hirano, Kanagawa, JP;

Tetsuya Nakanishi, Kanagawa, JP;

Inventors:

Masashi Onishi, Kanagawa, JP;

Masaaki Hirano, Kanagawa, JP;

Tetsuya Nakanishi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A glass-processing method adjusts the range of the heating region according to the work piece and processing condition, and a glass-processing apparatus implements the method. The method incorporates the heating of a glass body with a thermal plasma torch comprising (a) a main body provided with a plurality of ports from which a gas issues and (b) a device for applying a high-frequency electric field to the gas fed into the main body. The method comprises the steps of (1) adjusting the plasma flame's size perpendicular to the center axis of the main body by controlling the flow rate of the gas fed into each port according to the size of the glass body, the processing condition, or both and (2) heating the glass body. The apparatus comprises (a) a thermal plasma torch for heating a glass body, comprising (a1) a main body provided with a plurality of ports from which a gas issues and (a2) a device for applying a high-frequency electric field to the gas fed into the main body and (b) a device for adjusting the flow rate of the gas fed into each port.


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