The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jul. 01, 2003
Applicants:
Anna Lee Y. Tonkovich, Pasco, WA (US);
Yong Wang, Richland, WA (US);
Robert S. Wegeng, Richland, WA (US);
Yufei Gao, Kennewick, WA (US);
Inventors:
Anna Lee Y. Tonkovich, Pasco, WA (US);
Yong Wang, Richland, WA (US);
Robert S. Wegeng, Richland, WA (US);
Yufei Gao, Kennewick, WA (US);
Assignee:
Battelle Memorial Institute, Richland, WA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 3/26 (2006.01); C01B 3/16 (2006.01); C07C 1/02 (2006.01); B01J 8/04 (2006.01); F28D 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Reactors and processes are disclosed that can utilize high heat fluxes to obtain fast, steady-state reaction rates. Porous catalysts used in conjunction with microchannel reactors to obtain high rates of heat transfer are also disclosed. Reactors and processes that utilize short contact times, high heat flux and low pressure drop are described. Improved methods of steam reforming are also provided.