The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2006

Filed:

Feb. 28, 2005
Applicant:

Geunyoung Yoon, Pittsford, NY (US);

Inventor:

Geunyoung Yoon, Pittsford, NY (US);

Assignee:

University of Rochester, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/10 (2006.01); A61B 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device measures aberrations of an eye and contains a first light source, a lens, a reflective surface, and a wavefront sensor. The first light source is adapted to reflect light off eye's retina to produce a wavefront. The lens is adapted to receive light from the wavefront. The reflective surface is disposed so as to reflect light from the wavefront that is received by the lens back through the lens to produce an image of the wavefront. The wavefront sensor is adapted to receive light from the wavefront so as to provide a measure of the aberrations of the eye. The device may contain a second light source primarily at a second wavelength that illuminates the eye. Light from the second light source is substantially transmitted through the reflective surface to form an image of the eye that may be used to align the device.


Find Patent Forward Citations

Loading…