The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Jul. 23, 2003
David J. Nelson, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Thomas N. Blanton, Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Byron R. Sever, Rochester, NY (US);
David D. Tuschel, Monroeville, PA (US);
David J. Nelson, Rochester, NY (US);
Seshadri Jagannathan, Pittsford, NY (US);
Ramesh Jagannathan, Rochester, NY (US);
Thomas N. Blanton, Rochester, NY (US);
Sridhar Sadasivan, Rochester, NY (US);
Byron R. Sever, Rochester, NY (US);
David D. Tuschel, Monroeville, PA (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
Authentication systems, apparatus, and methods authenticate an identification marking including a nanocrystalline material. One or more properties of the marking are ascertained to provide a measured profile. The measured profile is compared to at least one member of a closed set of reference profiles. Each reference profile has predetermined values of one or more properties. Each reference profile is unique within the set. At least one reference profile is characteristic of an indicator material in a nanocrystalline morphology and non-characteristic of the same indicator material in a bulk morphology.