The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Oct. 17, 2003
Hung Liang HU, Los Altos Hills, CA (US);
Yaw Shing Tang, Saratoga, CA (US);
Liji Guan, Milpitas, CA (US);
Kochan Ju, Montesereno, CA (US);
Hung Liang Hu, Los Altos Hills, CA (US);
Yaw Shing Tang, Saratoga, CA (US);
Liji Guan, Milpitas, CA (US);
Kochan Ju, Montesereno, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Conventional perpendicular writers that utilize an extended return pole are subject to large flux leakage. This problem has been reduced in the prior art by adding a downstream shield. This still leaves significant upstream leakage. This has now been eliminated by adding an upstream shield and then connecting the up and downstream shields by using side shields. The latter need not extend all the way from the downstream to the upstream shield in which case their thickness is increased relative to the full side shields.