The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Jan. 23, 2003
Tadashi Hattori, Tochigi, JP;
Tadashi Hattori, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A high speed, wide-range, high-accuracy positioning stage device for eliminating errors due to deterministic elements such as variation of surface machining accuracy of a bar mirror and for preventing error accumulation due to indeterminate elements such as air fluctuations when switching between laser interferometers. When an X1 laser interferometer as a first position measurement device and an X2 laser interferometer as a second position measurement device are switched, at a place at which at least two position measurement devices are activated, when a value is handed over from the X1 laser interferometer, which was activated, to the X2 laser interferometer, which is to be activated, errors due to the effect of X-bar mirror flatness and air fluctuations are found by a correction function for the X-bar mirror and/or a table and the average of the measured values, and the value of the X2 laser interferometer is corrected by a correction device such as a calculation device.