The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Jan. 04, 2005
Hiroaki Tanaka, Tokyo, JP;
Michiaki Sakamoto, Tokyo, JP;
Takahiko Watanabe, Tokyo, JP;
Yoshiaki Hashimoto, Tokyo, JP;
Syuusaku Kido, Kagoshima, JP;
Hiroaki Tanaka, Tokyo, JP;
Michiaki Sakamoto, Tokyo, JP;
Takahiko Watanabe, Tokyo, JP;
Yoshiaki Hashimoto, Tokyo, JP;
Syuusaku Kido, Kagoshima, JP;
NEC LCD Technologies, Ltd., Kanagawa, JP;
Abstract
In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).