The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Aug. 05, 2003
Takeshi Shimizu, Tokyo, JP;
Takeshi Shimizu, Tokyo, JP;
NEC Plasma Display Corporation, Tokyo, JP;
Abstract
A method of measuring a gap between a mask and a substrate by providing a mask and a substrate facing each other. The mask includes an array of patterns, and a at least one window disposed between two of the patterns. Each of the patterns corresponds to a display device. The method also includes projecting an incident laser beam onto the substrate through the window of the mask and determining a gap between the mask and the substrate in a middle region of the substrate in response to first and second reflected beams. The first reflected beam is generated by the reflection of the incident laser beam by the mask, and the second reflected beam is generated by the reflection of the incident laser beam by the substrate. Determining the gap between the mask and the substrate in the middle region allows for the correction of any undesirable deflection of the mask.