The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2006

Filed:

Jul. 13, 2004
Applicants:

Yuichiro Tokunaga, Kyoto-fu, JP;

Takeshi Inao, Kyoto-fu, JP;

Inventors:

Yuichiro Tokunaga, Kyoto-fu, JP;

Takeshi Inao, Kyoto-fu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/00 (2006.01); G01B 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for measuring a film strength of a film on an object. An incident angle of pressure waves with respect to an object to be measured, the object including a base coated with a film, is set for applying the pressure waves to the object. The incident angle is varied over a range including a critical angle θcr. The object generates surface waves, in response to the pressure waves, at and near the critical angle. In response to the surface waves, the object generates leaky waves, which are pressure waves caused by the surface waves. The intensity of pressure waves including reflected waves and leaky waves from the object are measured. A received intensity Vat an incident angle where no leaky wave is generated, and the intensity difference Vbetween Vand the received intensity at the critical angle θcr when the film strength is high are measured. An intensity difference Vbetween Vand the received intensity when the intensity of the leaky waves remains unchanged, regardless of the changes in the incident angle, within the range where the leaky waves are generated, which indicates a low film strength, is also measured. Thus, the film strength is determined based on V, V, and V.


Find Patent Forward Citations

Loading…