The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Mar. 06, 2003
Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices
Kazuhiko Takahashi, Kawasaki, JP;
Masahiko Minemura, Kawasaki, JP;
Mitsuo Sakurai, Kawasaki, JP;
Kazuya Sugawa, Kawasaki, JP;
Kazuhiko Takahashi, Kawasaki, JP;
Masahiko Minemura, Kawasaki, JP;
Mitsuo Sakurai, Kawasaki, JP;
Kazuya Sugawa, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.