The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Feb. 02, 2004
Applicant:
Kazuhiko Asakawa, Miyagi, JP;
Inventor:
Kazuhiko Asakawa, Miyagi, JP;
Assignee:
OKI Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of determining remaining film thickness in polishing process provides a technology for controlling a polishing amount of CMP in a device isolating process with satisfactory accuracy regardless of the ratio between the area of each of device forming regions and that of each of trench regions, the type of abrasive, etc.
Asakawa, Kazuhiko. (2006). Method of determining remaining film thickness in polishing process (U.S. Patent No. 7039488). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7039488
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile