The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Aug. 31, 2000
Kazuhito Hori, Kanagawa, JP;
Kazuhito Hori, Kanagawa, JP;
Sony Corporation, , JP;
Abstract
A method of forming a mask pattern includes a formatting step for formatting authoring data in accordance with formats of specified media either by a fixed amount at a time or continuously. The authoring data is obtained by an authoring operation in which base information, such as image information or audio information, is edited. The method of forming a mask pattern also includes a mask pattern generating step in which basic pattern information is generated from basic signal pattern data necessary for various types of optical disks as a result of carrying out a pattern editing operation, and the basic pattern information is used to generate a mask pattern by carrying out a mask pattern generating operation. In the steps of a conventional method, it is necessary to carefully determine the conditions which allow disks produced after a plurality of later operations of the method have been carried out to satisfy standards. In addition, it is necessary to carefully observe at all times that these conditions are maintained during the long time required to produce the disks.