The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Jul. 27, 2004
Katsuyo Iwasaki, Nishinomiya, JP;
Kazuhiro Sugimoto, Ibaraki, JP;
Katsuyo Iwasaki, Nishinomiya, JP;
Kazuhiro Sugimoto, Ibaraki, JP;
Matsushita Toshiba Picture Display Co., Ltd., Osaka, JP;
Abstract
On an outer circumferential surface of a neck portion of a funnel, a CPU having a pair of quadrupole magnets and a pair of bar-shaped magnets each having magnetic poles on both sides in a major axis direction are provided. The pair of bar-shaped magnets sandwich the neck portion substantially in an in-line direction of an in-line type electron gun, and are provided so that identical poles are opposed to each other, between an end plate of an insulating frame of a deflection yoke and the CPU at a distance from the end plate. In the case where a rotational shift of electron beams is caused, electron beams R and B are corrected so as to move upward and downward (or downward and upward) respectively by a quadrupole magnetic field generated by the quadrupole magnets. Then, the electron beams R and B are corrected so as to move downward and upward (or upward and downward) respectively by the quadrupole magnetic field generated by the pair of bar-shaped magnets. Thus, a misconvergence due to the rotational shift of the electron beams can be corrected.