The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Nov. 04, 2004
Jui-hsi Chen, Taipei, TW;
Jui-Hsi Chen, Taipei, TW;
Arima Computer Corporation, Taipei, TW;
Abstract
A method for fabricating a color filter (CF) is provided. The method includes steps of providing a substrate and forming a dielectric layer thereon, performing a first lithography process with a first photoresist on the dielectric layer to form a plurality of first pixels, performing a second lithography process with a second photoresist on the dielectric layer to form a plurality of second pixels, wherein the second pixels overlap the first pixels, which the second pixels are next to, performing a third lithography process with a third photoresist on the dielectric layer such that the dielectric layer is covered with the third photoresist, and calendering a cylinder on the third photoresist to form a plurality of third pixels and to form a flat surface by the first, the second and the third pixels.