The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2006

Filed:

Dec. 27, 2002
Applicants:

Ryoichi Hirano, Tokyo, JP;

Satoshi Imura, Numazu, JP;

Noriaki Nakayamada, Numazu, JP;

Inventors:

Ryoichi Hirano, Tokyo, JP;

Satoshi Imura, Numazu, JP;

Noriaki Nakayamada, Numazu, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01K 13/12 (2006.01); G01K 1/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.


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Hirano, Ryoichi. (2006). Apparatus and method for forming pattern (U.S. Patent No. 7036980). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7036980

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