The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2006
Filed:
Feb. 13, 2003
Tatsuo Yamaguchi, Tokyo, JP;
Naoki Nakazawa, Tokyo, JP;
Toshifumi Mihashi, Tokyo, JP;
Yoko Hirohara, Tokyo, JP;
Tatsuo Yamaguchi, Tokyo, JP;
Naoki Nakazawa, Tokyo, JP;
Toshifumi Mihashi, Tokyo, JP;
Yoko Hirohara, Tokyo, JP;
Kabushiki Kaisha Topcon, Tokyo, JP;
Abstract
A model eye for an eye characteristic measuring device and a calibration method for the model eye. The model eye can have various aberrations and/or power characteristics to be formed by a combination of a refractive-type lens and a phase plate for adding aberration and can be used to confirm the accuracy of wavefront measurement or the like of the eye characteristic measuring device. The model eye includes an anterior eye lens forming a predetermined power to be given to the model eye, a diffusion surface diffusing and reflecting incident light, the diffusion surface being disposed at an image point position corresponding to the predetermined power in relationship to the anterior eye lens, and an aberration adding member giving a predetermined aberration to an area between the anterior eye lens and the diffusion surface. Power and aberration required for the model eye are formed by the anterior eye lens and the phase plate.