The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Nov. 27, 2002
Applicant:
Michio Matsuura, Kasawaki, JP;
Inventor:
Michio Matsuura, Kasawaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/095 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a method and an apparatus for aberration correction according to the invention, aberration occurring in recording/reproducing information derived from causes such as thickness variation of a substrate, a tilt, a focus error and a tracking error is detected, and the aberration is corrected by correcting these causes.
Matsuura, Michio. (2006). Method and apparatus for aberration correction (U.S. Patent No. 7035177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7035177
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