The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Jan. 12, 2004
Applicants:
Harmen Klass Van Der Schoot, Vught, NL;
Hernes Jacobs, Eindhoven, NL;
Martinus Arnoldus Henricus Terken, Lierop, NL;
Inventors:
Harmen Klass Van Der Schoot, Vught, NL;
Hernes Jacobs, Eindhoven, NL;
Martinus Arnoldus Henricus Terken, Lierop, NL;
Assignee:
ASLM Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/60 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.