The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Feb. 28, 2001
Yuichi Aki, Tokyo, JP;
Takao Kondo, Tokyo, JP;
Minoru Takeda, Tokyo, JP;
Masanobu Yamamoto, Kanagawa, JP;
Shin Masuhara, Tokyo, JP;
Toshiyuki Kashiwagi, Tokyo, JP;
Yuichi Aki, Tokyo, JP;
Takao Kondo, Tokyo, JP;
Minoru Takeda, Tokyo, JP;
Masanobu Yamamoto, Kanagawa, JP;
Shin Masuhara, Tokyo, JP;
Toshiyuki Kashiwagi, Tokyo, JP;
Sony Corporation, Tokyo, JP;
Abstract
An electron beam irradiation apparatus, includes a support section for supporting an electron beam irradiation subject to be irradiated with an electron beam, and an electron beam irradiation head opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head having an electron beam emission hole for irradiating the electron beam irradiation subject with the electron beam. In the electron beam irradiation head, an electron beam path communicating with the electron beam emission hole is provided, and in addition one or more ring shaped gas suction grooves opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole. Vacuum pumps are coupled to the electron beam path and the ring shaped gas suction grooves, and the electron beam path is held in a high vacuum state.